Mask Aligner

Mask Aligner tool system Manual Touch PLC Control systemWafer / Substrate Size : 6" wafer or betterMask size : 7 x 7 or betterChuck Motion : X,Y,Z Thata Axis ManualChuck Leveling : Wedge Error Compensation system UV Light Exposure OpticsUV Light source 350 450nm or betterUV Lamp Power 350W or betterLight uniformity : 3% or betterBeam Size : 6.25" 6.25" or better365nm Intensity : Max 25 mW or betterLamp Power ControlExposure Moving : Pneumatic moving Scope ModuleDual Micro ScopeManual Moving Stage : X,Y,Z AxisObjective spacing : 50 150mm or better rangeMoving Stage : Y Axis 20mm or better rangeMonitor : 21" or moreMagnification : 50x ~ 480x or better range

Our Mask Aligner has become synonymous with superior quality, high alignment accuracy, and sophisticated exposure optics. We offer a complete range of mask aligners for high-end fab automation, high volume production and R&D environments alike. Our principal designs their mask aligner systems for lithography applications in the field of 3D Packaging, Advanced Packaging, MEMS, LED, Compound Semiconductors, Power Devices, Photovoltaic, Nanotechnology and Wafer Level Optics. Our Mask Aligners process wafers from pieces up to 300mm in any kind of size, shape and thickness. The systems can be configured with manifold features that fit to various applications and are designed to achieve submicron resolution and overlay.

MIDAS SYSTEM CO., Ltd. develops and produces Mask Aligner and Spin Coater equipment required by laboratories and companies related semi-conductor, MEMS, Bio element and Nano Technologies. As for the mask aligner for wafer, we led the first development and commercialization in Korea, and continued to make up for the technologies in order to strengthen the basis as a technology centered company. Also the mask aligner for wafer is applicable for various fields and at present utilized in board fields such as the research and production of semi conductor, the research on the MEMS process and the production from MEMS applications, researched on bio chips and Nano technologies.

MIDAS SYSTEM develops and produces Mask Aligner and Spin Coater equipment required by laboratories and companies related semi-conductor, MEMS, Bio element and Nano Technologies. As for the mask aligner for wafer, MIDAS SYSTEM led the first development and commercialization in Korea, and continued to make up for the technologies in order to strengthen the basis as a technology centered company. Also the mask aligner for wafer is applicable for various fields and at present utilized in board fields such as the research and production of semi conductor, the research on the MEMS process and the production from MEMS applications, researched on bio chips and Nano technologies.

ALIGNMENT FLOW

Double Side Mask Aligner

Based on the highly successful and field-proven EVG620, the HBL-version is optimized for lowest cost-of-ownership and highest yield in compound semiconductor manufacturing. Continuous processing of up to 165 wafers, highest alignment accuracy and the capability to handle bowed, warped and transparent substrates such as sapphire, SiC, AlN, metallic or ceramic substrates with sizes up to 150 mm make the EVG620HBL the perfect solution for high volume manufacturing of HB-LEDs and compound semiconductors. Features Dedicated mask alignment system for HB-LEDs Supporting wafer sizes up to 150 mm Up to 220 wafers per hour in first print mode with highest throughput design* Up to 165 wafers per hour throughput including automatic alignment* Superior automatic alignment software supporting synthetic pattern training and automatic origin setting and centering Recipe controlled microscope illumination spectrum for best pattern contrast with various wafer and layer materials

Vacuum contact(proximity up to 9" x 9" masks) Front/back side mask Aligner, IR mask Aligner. UV Exposure system. UV Energy/Intensity meter. Mask Aligners Series : 200, 2000, 500 IR, 5000, 800 & 8000, Wafer Bonder Nano Imprint

The MDA-400M is widely used for MEMS and Optoelectronics applications. In its contact exposure modes, MDA-400M can achieve a resolution of 1 , a performance unsurpassed in any other comparable machine. It is deal, economical unit for laboratories and low volume production.

Mask Aligner System

Mask Aligner

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